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Monolayer tungsten disulfide (1H-WS₂) flakes have been exfoliated from bulk tungsten disulfide (2H-WS₂) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.
Monolayer tungsten diselenide (1H-WSe₂) flakes have been exfoliated from bulk tungsten diselenide (2H-WSe₂) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.
Substrate: Sapphire (c-cut) Quartz (Silica) TEM grids (please supply grids) Thermal Oxide (SiO2/Si) Polyethylene terephthalate – PET Substrates
Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses.
高純度黑磷晶體(tǐ) Black Phosphorus-Crystal 晶體(tǐ)結構:正斜方晶結構晶體(tǐ)尺寸:~10mm 電(diàn)學性能:半導體(tǐ) 晶體(tǐ)結構:斜方晶系 晶胞參數:a = 0.331 nm, b= 1.048, c = 0.437 nm, α = β = γ = 90° 晶體(tǐ)類型:合成 晶體(tǐ)純度:99.995% 性質:半導體(tǐ)
黑砷磷/晶體(tǐ)黑磷-砷合金 BP-As alloy (Black Phosphorus-Arsenic Alloy) 晶體(tǐ)尺寸:~mm 電(diàn)學性能:半導體(tǐ) 晶體(tǐ)結構:斜方晶系 晶胞參數:晶胞參數取決于合金中(zhōng)的成分(fēn)。p/As比值爲1 a = b = 0.338 nm, b = 10.743 nm, c = 0.446 nm, α = β = γ = 90° 晶體(tǐ)類型:合成 晶體(tǐ)純度:99.995%
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